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Plasma Deposition & Etching
Plasma Deposition PECVD
SI500D
SI500PPD
Plasma Etching ICP-RIE and RIE
SI500
SI500C
SI500-300
Etchlab 200
SI591
SI100
Cluster Configurations
Cluster Tool
Small Cluster
Process Monitoring

Cluster Configurations

Etch (ICP, RIE) modules, deposition modules (PECVD, ALD), cassette stations and productive robots can be combined to cluster systems for R&D and production to meet the requirements of closed processing and high throughput.

  • Fully automated ICP and RIE etchers for compound semiconductor processing
  • Large area substrate processing for masks and micro-optics
  • High throughput chromium etch cluster
Cluster Tool

ICP-etch and deposition modules with two cassette station for high throughput processing of 200 mm wafers.

Small Cluster Tool

ICP etchers, RIE etchers, PECVD and ICPECVD deposition systems can be combined into one cluster tool with 3 process systems.
 
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