Mi-Net Technology Ltd is a supplier of sputtering targets for thin film coating applications. High purity sputtering targets are homogenous, fine grained, high density and can be machined to required dimensions.
We pride ourselves on our commitment to our customer's needs, so if there is something specific you require please ask and we will do our best to supply it for you.
Standard Specifications
| Shape | Round | Rectangle |
| Size | 1", 2" , 3" , 4" , 5", 6" , 8" | 400 x 400 mm |
| Thickness | 2 mm ~ 70 mm | 2 mm ~ 70 mm |
| Purity | 99.9% ~ 99.9999 % | 99.9% ~ 99.9999 % |
| Backing Plate | OFHC Copper | OFHC Copper |
Sputtering targets Available
| Targets |
| Pure elements | Borides |
| Pure metals | Carbides |
| Alloys | Fluorides |
| Rare earths | Nitrides |
| Single crystals | Silicides |
| Compounds | Tellurides |
| Ceramics | Sulfides |
| Oxides | |
For more information please contact a member of our sales team.
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