It has never been easier to apply ellipsometry to real-world samples.
- The SE 500adv combines ellipsometry and reflectometry,
- Eliminates the ambiguity in layer thickness determination for transparent films,
- Extends thickness measurement to 25000 nm.
Specifications:
- Laser wavelength 632.8 nm
- Spectral range of reflectivity from 450 nm to 920 nm wavelength
- Spot size 80 µm
- 150 mm (z-tilt) stage;
- Goniometer with angles of incidence set in 5° steps
- Ethernet interface
- Small footprint
The SE 500adv can be operated as a laser ellipsometer, as a CER ellipsometer, or as a film thickness probe FTPadvanced. As result it offers a maximum flexibility never reached by standard laser ellipsometers.
- Operated as ellipsometer
Single and multiple angle measurements can be performed to determine optical parameters and film thickness of up to three layers using one wavelength at 632.8 nm.
- Operated as film thickness probe FTPadvanced
The thickness of a transparent or weakly absorbing layer is measured by a white light reflection method under normal incidence, but the optical parameters of the layer has to be known. The advanced software FTPadv Expert allows the measurement of multiple layers.
- Operated as CER ellipsometer
The cyclic thickness period for transparent layers is instantly determined. The accuracy of the refractive index in first cyclic thickness order is strongly increased (i.e. for thin layers / see our patent). Cauchy coefficients can be determined for transparent layers.
The SE400advanced is designed to tap the full potential of the method ellipsometry and to push the limits. The core concept of the SE400advanced with highly phase stabilized compensator, computer controlled frequency stabilized rotating analyzer and automated polarizer optimum positioning allows for the measurement of ultra thin films and surface roughness on almost any kind of absorbing or transparent substrate with a flat, mirror - like surface.
| Precision1) of Ψ, Δ at 90° (transmission) position | δ(Ψ)=0.002°, δ(Δ)=0.002° |
| Long term stability2) | δ(Ψ)=±0.1°, δ(Δ)=±0.1° |
| Precision1) of film thickness | 0.1 Å for 100 nm SiO2 on Si |
| Precision1) of refractive index | 5×10-4 for 100 nm SiO2 on Si |
1) precision is defined as standard deviation (1 sigma) of 30 measurements
2) long term stability is measured over 24 hours at 90° position
Options:
- Manual x-y stage with 150 mm travel
- Mapping (x-y, up to 200 mm, vacuum chuck)
- Camera option for sample alignment and monitoring
- 30 µm micro spot
- Second wavelength (405 nm or 1550 nm)
- Auto focus
- SIMULATION software
Please contact us for more information.
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