Application Note - 3D Profiling On Periodic Nanostructures Using Ellipsometry Equipped For Complete Mueller Matrix Measurements


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Related Product Family - Sentech Ellipsometers

SENTECH 3D Profiling is designed to determine critical dimensions (CD) such as the grating period, height and shape of periodic micro- and nanostructures. The software package is an optional module of the SENTECH comprehensive ellipsometer software SpectraRay/4. It is based on the method of rigorous coupled wave analysis (RCWA). The advantage of SENTECH 3D Profiling compared to AFM or SEM is its non-destructive nature. The CDs are measured by optical investigation with high accuracy and precision without physically contacting the sample.