Application Note - High selectivity SiNx Etching by SENTECH SI 500 ICP-RIE etching system


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Silicon nitride (SiNx) is widely used in microelectronics and optics as a masking, dielectric, or passivation layer. Wet etching techniques are no longer capable of fulfilling the industry requirements of SiNx processing in terms of anisotropic etching of microstructures. Hence, good selectivity at moderate etch rates is important for ensuring a low damage processing. This application note presents a successful ICP process result with a moderate etch rate and a proper selectivity to photoresist mask.

High selectivity SiNx Etching