Silicon Blocks

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Silicon Blocks

Mi-Net Technology Ltd is a supplier of silicon blocks for neutron reflectivity and neutron backscattering spectroscopy. Our blocks are polished to extremely low levels of roughness < 2Å (RMS). This low roughness is possible on refurbished silicon blocks as well as new silicon blocks.

Specifications

Main Applications - Neutron Reflectivity, Neutron Backscattering Spectroscopy

Orientation - On standard: (100) (111) (110) On request: (211) (311) (411) (511) (711) (911) (210) (310) (510) (910) (531) (731)

Off Cut - Compared to ON axis (100), (111), (110), (112): Up to 14° ± 0.02°

Type - Undoped, P-type: Boron, N-type: Phosphorus, Arsenic, Antimony

Resistivity - Intrinsic: > 200 Ω.cm, Cz: from 0,7 mΩ.cm to 150 Ω.cm, FZ: up to 10k Ω.cm

General Specifications - Maximum Size: 120x60x30mm, Roughness: On polished surface: < 2 Å (RMS), Flatness: On polished surface: < 1 μm

Laser Marking - On Request

Thermal Oxidation

Wet Oxidisation - 200-3000nm thick, +/-10%

Standard Dry Oxidation - 15-100nm thick +/-5%

High Purity Dry Oxidation - 20-350nm thick +/-5%.

*Multilayer deposition available on request.

Single Layer Deposition / Metallization

Silicon Nitride - By LPCVD or PECVD to 200-500nm thick +/-5%

Oxide Nitride - By PECVD to 200-500nm thick +/-5%

Polysilicon - By LPCVD to 200-600nm thick +/-8%

Cr, Ti, Au, Al, Pt, Mo, W Highly reflective silver coating - By PVD Sputtering to 200-1000nm thick (depending on metals) +/-10%

Ni, Cu, Ir, Ta, Al2O3 - By evaporation to 200-1000nm thick (depending on metals) +/-10%

Cr/Au TiW with Ti : 10% W : 90% TiW /Au with Ti : 10% W : 90% Ti/Pt - By PVD to 200-1000nm thick (depending on metals) +/-10%

*Multilayer deposition available on request.