Plasma Deposition PECVD
Low damage plasma enhanced chemical vapour deposition
We supply PECVD systems from Sentech Instruments of Berlin Germany. The PECVD systems from Sentech feature outstanding deposition properties such as low etch rate, high breakdown voltage, low stress, low damage of substrate and very low interface state density down to deposition temperatures of less than 100 degrees Celcius allowing for outstanding properties of the deposited thin films.
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