The Depolab 200 is a cost effective plasma etcher with an open top design. This means there is no load lock and so the tool is pumped down to allow simple sample loading directly into the chamber.
The tool has a small footprint so is ideal for clean rooms where space is at a premium. Wafers of up to 200mm can accommodated and large diagnostic windows located at the top electrode and reactor can easily accommodate a SENTECH laser interferometer or OES and RGA process monitoring systems.
Configured to deposit SiO2, SiNx, SiONx and a-Si films in temperature range up to 400°C. Well suited for deposition of dielectric films for etching masks, membranes, electrically isolating films and others.
As with all SENTECH tools the Depolab 200 comes with powerful but user friendly control software.
SENTECH Instruments of Berlin have been manufacturing tools for thin film metrology and processing since 1990. They are a growing company with a reputation for high quality reliable equipment and excellent service.
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