Vacuum Magnetron Sputtering
Deposition of coatings by the sputtering technique
The sputtering process starts by creating a glow discharge between two polarised electrodes. This discharge under vacuum leads to ignition of a cold plasma composed of charged particles which collide with a cathode target under an electric field. This bombardment causes sputtering of atoms from the target onto a substrate.
![Alliance Concept AC450 Magnetron Sputtering](https://www.mi-net.co.uk/wp-content/uploads/2021/11/AC450.jpg)
Research and development tool with 450mm diameter chamber
![EVA300 Vacuum Evaporation and Magnetron Sputtering](https://www.mi-net.co.uk/wp-content/uploads/2022/02/EVA300.jpg)
Compact and cost effective tool with high performance
![DP650](https://www.mi-net.co.uk/wp-content/uploads/2022/01/DP650.jpg)
Flagship sputtering tool with 650mm diameter chamber
![dp850](https://www.mi-net.co.uk/wp-content/uploads/2022/01/dp850.jpg)
Production sputtering tool with 850mm diameter chamber
![dp1100](https://www.mi-net.co.uk/wp-content/uploads/2022/01/dp1100.jpg)
Large chamber sputtering tool with 1100mm diameter chamber
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