The DP850 sputtering tool is a dedicated production tool. Sources can be configured up to 6 x 200mm magnetron cathodes enabling the deposition of complex multilayers. A load lock allows optimisation of time cycles and a high quality of deposited film.

It is also possible to adapt the DP850 for research applications requiring source configurations of 10 x 2″ cathodes or more.


Alliance Concept of Annecy France is a world-renowned company specializing in the supply of vacuum technology equipment. They have been in business for over 25 years and are experts in areas such as PVD cathode sputtering, vacuum evaporation, leak testing and more.


Key Features

  • Production applications
  • 850mm diameter vacuum chamber
  • Sputter up or down
  • Load lock manual or motorized
  • Substrate holder cooled and/or heated up to 800°C
  • RF, DC or DC+ power supplies for sputtering

If you need a quote or would like more information on this product then please get in touch

Other Products in Range

Other instruments in the Alliance Concept PVD range.

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