The Etchlab 200 is a cost effective RIE plasma etcher with an open top design. This means there is no load lock and so the tool is pumped down to allow simple sample loading directly into the chamber.
The tool has a small footprint so is ideal for clean rooms where space is at a premium. Wafers of up to 200mm or even 300mm can be accommodated and large diagnostic windows located at the top electrode and reactor can easily accommodate a SENTECH laser interferometer or OES and RGA process monitoring systems.
As with all SENTECH tools the Etchlab 200 comes with powerful but user friendly control software.
SENTECH Instruments of Berlin have been manufacturing tools for thin film metrology and processing since 1990. They are a growing company with a reputation for high quality reliable equipment and excellent service.
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