The SENDURO spectroscopic ellipsometer simplifies the process of measuring thickness and refractive index of single films and layer stacks on substrates up to 200mm diameter. It is easy to use and delivers high throughput via automatic height and tilt alignment of samples before measurement. Measurement of a sample will typically take less than ten seconds including placing the sample on the sample stage, automatic alignment, data acquisition, calculation, displaying the results and finally removing the sample.
SENTECH Instruments of Berlin have been manufacturing tools for thin film metrology and processing since 1990. They are a growing company with a reputation for high quality reliable equipment and excellent service.
Fast and automated sample mapping is available.
Multilayer Analysis
Thickness map of spin coated photoresist / Silicon substrate with step size of 500µm and 100µm
Thickness map of Al2O3 / Silicon substrate according to SEMI standard
SENTECH regularly document and publish work using their thin film metrology tools. We keep many of these resources on our website in the form of application notes or publications. These are a great way to learn more about what can be achieved with a Sentech tool.
Other instruments in the SENTECH thin film metrology range.
We’re here and ready to provide information and answers to your questions
©Mi-Net 2023. All Rights Reserved.
Website by Fifteen.co.uk
