The SENDURO spectroscopic ellipsometer simplifies the process of measuring thickness and refractive index of single films and layer stacks on substrates up to 200mm diameter. It is easy to use and delivers high throughput via automatic height and tilt alignment of samples before measurement. Measurement of a sample will typically take less than ten seconds including placing the sample on the sample stage, automatic alignment, data acquisition, calculation, displaying the results and finally removing the sample.

SENTECH Instruments of Berlin have been manufacturing tools for thin film metrology and processing since 1990. They are a growing company with a reputation for high quality reliable equipment and excellent service. 

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Key Features

  • Automated spectroscopic ellipsometry
  • Spectral range of 290nm – 1000nm
  • Measurement of thin film thickness and refractive index
  • Easy to use with results in less than 10 seconds
  • Easy to install benchtop tool with only two connections needed to start working
  • Maximum 200mm diameter samples with mapping options available
  • Low noise due to no moving parts with Step Scan Analyzer principle
  • Comprehensive SpectraRay/4 measurement software. One of the most powerful packages available on the market so please contact us for a demo
  • Comprehensive SENTECH materials library for efficient modelling


Fast and automated sample mapping is available.

Multilayer Analysis

SENTECH SENDURO MEMS Automated Spectroscopic Ellipsometer

Thickness map of spin coated photoresist / Silicon substrate with step size of 500µm and 100µm

SENTECH SENDURO MEMS Automated Spectroscopic Ellipsometer

Thickness map of Al2O3 / Silicon substrate according to SEMI standard

SENTECH SENDURO MEMS Automated Spectroscopic Ellipsometer

If you need a quote or would like more information on this product then please get in touch

Other Products in Range

Other instruments in the SENTECH thin film metrology range.

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